SPIE. ADVANCED LITHOGRAPHY 2020
イベント概要
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開催日
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2020.02.23〜2020.02.27
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開催場所
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アメリカ（サンノゼ）
SPIE Advanced Lithography が、2/23から27にアメリカ合衆国のサンノゼで開催されます。光学リソグラフィ、計測手法、そしてEUVリソグラフィに注目した会議プログラムが組まれています。
東京エレクトロン(TEL)は、7件の口頭発表、2件のポスター展示に加え、4件の招待講演と基調講演への登壇を予定しています。
Keynote speech / Invited talks
[Keynote speech]
Etch and film co-optimization for high fidelity patterning
[Invited talks]
1. Novel etch technologies utilizing atomic layer process for advanced patterning
2. Implementing effective process control strategies and reaping the benefits of data utilization
[keynote speech]
Akiteru Ko (Tokyo Electron Ltd.)
[Invited talks]
1. M. Honda *1, T. Katsunuma *1, S. Kumakura *2, T. Hisamatsu *1 and Y. Kihara *1
*1 Tokyo Electron Miyagi Ltd.
*2 Tokyo Electron Ltd.
2. Carlos Fonseca (Tokyo Electron America, Inc.)
Oral presentations
1. Statistical local CD uniformity with novel SEM noise reduction method
2. Explorations of missing hole defect in EUV patterning
3. Defect mitigation of chemo-epitaxy DSA patterns
4. Plasma process of Silicon Germanium alloy: molecular dynamics simulation study
5. Improvement of self-aligned dual patterning using spin-on-carbon mandrel
1. Shinji Kobayashi (Tokyo Electron Kyushu Ltd.)
2. Hidetami Yaegashi, Arisa Hara, Soichiro Okada and Satoru Shimura (Tokyo Electron Ltd.)
3. Makoto Muramatsu *1, Takanori Nishi *1, Yasuyuki Ido *1 and Takahiro Kitano *2
*1 Tokyo Electron Kyushu Ltd.
*2 Tokyo Electron Ltd.
4. Hojin Kim, Yun Han, Mingmei Wang, Andrew Metz and Peter Biolsi (TEL Technology Center, America, LLC)
5. Caitlin Philippi, Sophie Thibaut, Andrew Metz, Akiteru Ko, Angélique Raley and Peter Biolsi (TEL Technology Center, America, LLC)
Poster exhibitions
Consideration of missing defect suppression technique in EUV hole patterning
Arisa Hara *1, Soichiro Okada *1, Satoru Shimura *1 and Hidetami Yaegashi *2
*1 Tokyo Electron Kyushu Ltd.
*2 Tokyo Electron Ltd.
