プロセスエンジニア必見！ International Conference on Extreme Ultraviolet Lithography 2023
イベント概要
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開催日
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2023.10.02〜2023.10.05
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対象者
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プロセスエンジニア
10月2日-5日にInternational Conference on Extreme Ultraviolet Lithography 2023が米国カリフォルニア州モントレーコンベンションセンターで開催されます！本展示会では、さらなる微細化を可能にするExtreme Ultraviolet Lithography(極端紫外線リソグラフィ)に焦点を当て、EUV技術とインフラ準備の世界的な状況を取り上げます。EUV露光用塗布現像装置のシェアをほぼ100％有する東京エレクトロン(TEL)からは、imecやIBM Corp.などのパートナー企業との共著案件を含む、5件の発表をおこないます！
Invited Paper
2 October 2023 1:40 PM - 2:00 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Litho process development for pillars to enable high density 4f2 memory cells at 34nm pitch
M. Pak, imec
A. Dauendorffer, K. Nafus, Tokyo Electron Kyushu Ltd.
A. Das, M. Hasan, P. A. Rincon-Delgadillo, imec
4 October 2023 • 11:35 AM - 11:55 AM PDT | Monterey Conv. Ctr., Steinbeck 2/3
Coater/Developer-based patterning techniques to achieve tight pitches with 0.33 NA single exposure
K. Kato, L. Huli, N. Antonovich, D. Hetzer, A. Krawicz, N. Bae, E. Liu, A. Ko, TEL Technology Center, America, LLC
S. Shimura, S. Kawakami, D. Conque, Tokyo Electron Kyushu Ltd.
T. Kitano, S. Nagahara, Tokyo Electron Ltd.
L. Meli, I. Seshadri, M. Burkhardt, K. Petrillo, IBM Corp.
S. Grzeskowiak, TEL Technology Center, America, LLC
Presentation
2 October 2023 • 4:30 PM - 4:45 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Advanced development for contact-holes of metal-oxide resists
C. Que Dinh, Tokyo Electron Kyushu Ltd.
S. Nagahara, Tokyo Electron Ltd.
K. Kato, TEL Technology Centert, America, LLC
S. Kawakami, Y. Kuwahara, K. Cho, S. Okada, Tokyo Electron Kyushu Ltd.
K. McInerney, L. Huli, TEL Technology Center, America, LLC
M. Muramatsu, Tokyo Electron Kyushu Ltd.
2 October 2023 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos Ballroom
Holistic litho-etch approach towards high NA EUV challenges
S. Okada, A. Dauendorffer, Y. Kuwahara, S. Shimura, Tokyo Electron Kyushu Ltd.
P. Foubert, D. De Simone, imec
C. Que Dinh, Tokyo Electron Kyushu Ltd.
A. Tsuboi, Tokyo Electron Ltd.
K. Nafus, Tokyo Electron America Inc.
4 October 2023 • 2:50 PM - 3:05 PM PDT | Monterey Conv. Ctr., Steinbeck 3
Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine
H. Betsumiya, Y. Jin, Y. T. Ito, T. Kozawa, SANKEN, Osaka Univ.
K. Sakamoto, M. Muramatsu, Tokyo Electron Kyushu Ltd.
