SPIE Photomask Technology + Extreme Ultraviolet Lithography

半導体製造はどこへ行くのか？
微細化が突入するオングストローム時代に貢献する新技術を知りたいなら、この会議は必見です！

9月30日～10月3日、米国カリフォルニア州モントレー会議センターで「International Conference on Extreme Ultraviolet Lithography 2024」が開催されます。EUV露光用 塗布現像装置でほぼ100%のシェアを有する東京エレクトロン(TEL)は、imec、大阪大学、SANKENなどの共著者とともに、3件の発表をおこないます。ぜひご参加ください！
#TechnologyEnablingLife

1 October 2024 • 9:15 AM - 9:30 AM PDT | Monterey Conf. Ctr., Steinbeck 3
Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology
Shubhankar Das1, Victor M. Blanco Carballo1, Bappaditya Dey1, Xiang Liu2, Christopher Catano3, Guillaume Schelcher1, Danilo De Simone1
1.imec
2.Tokyo Electron Europe Ltd.
3.TEL Technology Center., America, LLC

2 October 2024 • 2:40 PM - 2:55 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Development kinetics analysis based on frequency and impedance changes measured with quartz crystal microbalance method
Yuqing Jin1, Yuko Tsutsui Ito2, Takahiro Kozawa2, Takashi Hasebe3, Kazuo Sakamoto3, Muramatsu Makoto3
1.Osaka Univ.
2.SANKEN, Osaka Univ.
3.Tokyo Electron Kyushu Ltd.

3 October 2024 • 11:45 AM - 12:00 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Novel lithography process for enhanced high numerical aperture EUV patterning performance
Yuhei Kuwahara1, Soichiro Okada1, Satoru Shimura1, Kathleen Nafus2, Philippe Foubert3
1.Tokyo Electron Kyushu Ltd.
2.Tokyo Electron America, Inc.
3.imec