SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025
イベント概要
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開催日
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2025.09.22〜2025.09.25
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開催場所
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Monterey, CA
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対象者
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プロセスエンジニア
SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025が9月22日から25日まで米国カリフォルニア州モントレーで開催されます！本学会では、半導体製造およびEUVリソグラフィ、パターニング技術、メトロロジー、プロセスインテグレーションに焦点が当てられています。
東京エレクトロン(TEL)は、Coater/Developerをはじめとする幅広い半導体製造装置のラインアップを生かし、微細化技術の進展に取り組んでいます。最新の研究成果について、TELからは共著案件を含む5件の発表をおこないます！
またWomen in Optics Networking Lunchには、Featured SpeakerとしてJennifer Church が登壇します！ネットワーキングの機会をぜひお楽しみに！
◆Women in Optics Networking Lunch
24 September 2025 • 12:00 PM - 1:00 PM PDT | Monterey Conf. Ctr., Colton 3
Connect with other women in the semiconductor industry over an informal networking lunch. Gain insights from our featured speakers as they share their career journeys and offer valuable advice to support your professional growth in this dynamic field.
Featured Speakers
Vicky Philipsen (imec)
Anna Tchikoulaeva (Lasertec)
Indira Seshadri (IBM)
Jennifer Church (TEL)
◆Presentations with co-authors
Optimization of contact hole printability in high-NA EUV
22 September 2025 • 4:50 PM - 5:05 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Coater/developer-based patterning process techniques to achieve tight pitches towards high numerical aperture extreme ultraviolet lithography
22 September 2025 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos III/IV
A holistic approach to extending resist material viability in extreme ultraviolet lithography
22 September 2025 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos III/IV
Fabrication feasibility of high-quality SRG waveguides for augmented reality applications
24 September 2025 • 2:05 PM - 2:20 PM PDT | Monterey Conf. Ctr., Steinbeck 2
Computationally guided formulation of advanced developers for EUV resists
25 September 2025 • 9:20 AM - 9:35 AM PDT | Monterey Conf. Ctr., Steinbeck 3
